联系我们
公司简介
招聘信息
Contact Us
About Us
|
Red sensitive photomaterials for photomasks
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| PFG - Silver-Halide photomaterial | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
|
|
The PFG Silver Halide materials are equivalent to the well-known technical photo-materials previously produced by Agfa and Kodak. All materials can optionally be supplied coated onto Polyester or Triacetate substrate films. The characteristic curve for the PFG is shown in Figs. 1. The grain size distribution is shown in Fig. 2.
PFG photographic plates are a practical replacement for Agfa (Millimask) and Kodak (HR-P, TE) plates.
The plates are specifically designed for the manufacturing of high-precision photographic masks for microelectronics. High resolution, high durability and excellent adhesion of the emulsion layer to the glass substrate enable photographic features of less than 2.5 micrometers to be recorded. All photo-plates are usually supplied in a cardboard package containing 6 units each. The largest plate size available as a standard size is 406x300 mm. The standard glass thickness is 2.5 mm. Antireflection plates coating on request. Guaranteed lifetime - 12 months.
|
|||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| PFG materials characteristics | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
|
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Processing and Handling Recommendations: | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
|
- Unseal and process in indirect non-actinic light with use of a dark-red light filter (transmission zone 600 nm and more). A characteristic curve for the VRP series materials is shown in Figs. 1. The grain size distribution for VRP material is shown in Fig. 2
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Recommended processing for PFG materials for the masks production | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||